Publication:
The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation
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| cris.virtualsource.orcid | 3133fd1f-edd3-4f57-83bd-255a85992bcd | |
| dc.contributor.author | Tan, Ling Ee | |
| dc.contributor.author | Treska, Fergo | |
| dc.contributor.author | Gillijns, Werner | |
| dc.contributor.author | Van de Kerkhove, Jeroen | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Kim, Ryan Ryoung Han | |
| dc.contributor.imecauthor | Tan, Ling Ee | |
| dc.contributor.imecauthor | Treska, Fergo | |
| dc.contributor.imecauthor | Gillijns, Werner | |
| dc.contributor.imecauthor | Van de Kerkhove, Jeroen | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Kim, Ryoung-han | |
| dc.contributor.orcidimec | Tan, Ling Ee::0000-0002-3143-5176 | |
| dc.contributor.orcidimec | Treska, Fergo::0000-0002-0171-5847 | |
| dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
| dc.contributor.orcidimec | Van de Kerkhove, Jeroen::0009-0005-4824-0411 | |
| dc.contributor.orcidimec | De Bisschop, Peter::0000-0002-8297-5076 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2025-08-29T03:57:12Z | |
| dc.date.available | 2025-08-29T03:57:12Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/12.3034348 | |
| dc.identifier.eisbn | 978-1-5106-8158-3 | |
| dc.identifier.isbn | 978-1-5106-8157-6 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/46129 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 132161C | |
| dc.source.conference | 2024 Conference on Photomask Technology | |
| dc.source.conferencedate | 2024-09-30 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 14 | |
| dc.title | The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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