Publication:

The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3034348
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dc.contributor.authorTan, Ling Ee
dc.contributor.authorTreska, Fergo
dc.contributor.authorGillijns, Werner
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryan Ryoung Han
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorTreska, Fergo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryoung-han
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecTreska, Fergo::0000-0002-0171-5847
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecVan de Kerkhove, Jeroen::0009-0005-4824-0411
dc.contributor.orcidimecDe Bisschop, Peter::0000-0002-8297-5076
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2025-08-29T03:57:12Z
dc.date.available2025-08-29T03:57:12Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3034348
dc.identifier.eisbn978-1-5106-8158-3
dc.identifier.isbn978-1-5106-8157-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/46129
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage132161C
dc.source.conference2024 Conference on Photomask Technology
dc.source.conferencedate2024-09-30
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages14
dc.title

The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation

dc.typeProceedings paper
dspace.entity.typePublication
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