Publication:

Comparison of C-, N-, and O-Incorporated Non-blistering PECVD Si Films for Application in SiOx-Based Passivating Contacts for Si Solar Cells

Date

2022
Journal article
https://doi.org/10.1021/acsaem.2c01631
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dc.contributor.authorSharma, Rajiv
dc.contributor.authorAlleva, Alessandro
dc.contributor.authorHajjiah, Ali
dc.contributor.authorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.authorPoortmans, Jef
dc.contributor.imecauthorSharma, Rajiv
dc.contributor.imecauthorAlleva, Alessandro
dc.contributor.imecauthorHajjiah, Ali
dc.contributor.imecauthorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecSharma, Rajiv::0000-0002-6724-1437
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.contributor.orcidimecSivaramakrishnan Radhakrishnan, Hariharsudan::0000-0003-1963-273X
dc.date.accessioned2023-03-23T15:38:03Z
dc.date.available2022-08-31T02:40:28Z
dc.date.available2022-09-05T08:12:36Z
dc.date.available2023-03-23T15:38:03Z
dc.date.embargo9999-12-31
dc.date.issued2022
dc.identifier.doi10.1021/acsaem.2c01631
dc.identifier.issn2574-0962
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40325
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage9994
dc.source.endpage10001
dc.source.issue8
dc.source.journalACS APPLIED ENERGY MATERIALS
dc.source.numberofpages8
dc.source.volume5
dc.subject.keywordsBlistering
dc.subject.keywordsPassivating contacts
dc.subject.keywordshydrogenated amorphous silicon
dc.subject.keywordspoly-Si/SiOx contact
dc.subject.keywordssilicon solar cells
dc.title

Comparison of C-, N-, and O-Incorporated Non-blistering PECVD Si Films for Application in SiOx-Based Passivating Contacts for Si Solar Cells

dc.typeJournal article
dspace.entity.typePublication
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