Publication:

Litho Process Development for Pillars to Enable High Density 4F<SUP>2</SUP> Memory Cells at 34nm Pitch

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2686265
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dc.contributor.authorPak, Murat
dc.contributor.authorDauendorffer, A.
dc.contributor.authorNafus, K.
dc.contributor.authorDas, Arijit
dc.contributor.authorHasan, Mahmudul
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.imecauthorPak, Murat
dc.contributor.imecauthorDas, Arijit
dc.contributor.imecauthorHasan, Mahmudul
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.orcidimecPak, Murat::0009-0002-5784-619X
dc.date.accessioned2024-05-23T12:25:06Z
dc.date.available2024-01-13T17:47:51Z
dc.date.available2024-05-23T12:25:06Z
dc.date.issued2023
dc.description.wosFundingTextThe authors from imec and TEL wish to thank the imec AP department, MRAM program members and the involved partners for their support.
dc.identifier.doi10.1117/12.2686265
dc.identifier.eisbn978-1-5106-6749-5
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43407
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 1275004
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages11
dc.source.volume12750
dc.title

Litho Process Development for Pillars to Enable High Density 4F2 Memory Cells at 34nm Pitch

dc.typeProceedings paper
dspace.entity.typePublication
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