Publication:
Pore sealing of SiOCH ultra low-k dielectrics with polyimide Langmuir-Blodgett film
Date
| dc.contributor.author | Goloudina, S.I. | |
| dc.contributor.author | Ivanov, A.S. | |
| dc.contributor.author | Krishtab, M.B. | |
| dc.contributor.author | Luchinin, V.V. | |
| dc.contributor.author | Pasyuta, V.M. | |
| dc.contributor.author | Gofman, I.V. | |
| dc.contributor.author | Sklizkova, V.P. | |
| dc.contributor.author | Kudryavtsev, V.V. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.date.accessioned | 2021-10-20T11:14:40Z | |
| dc.date.available | 2021-10-20T11:14:40Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20732 | |
| dc.source.beginpage | mrss12-1428-c02- | |
| dc.source.conference | Interconnect Challenges for CMOS Technology - Materials, Processes and Reliability for Downscaling, Packaging and 3D Stacking | |
| dc.source.conferencedate | 9/04/2012 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.title | Pore sealing of SiOCH ultra low-k dielectrics with polyimide Langmuir-Blodgett film | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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