Publication:

Modeling of copper diffusion in amorphous aluminum oxide in CBRAM memory stack

Date

2012
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorSankaran, Kiroubanand
dc.contributor.authorGoux, Ludovic
dc.contributor.authorClima, Sergiu
dc.contributor.authorMees, Maarten
dc.contributor.authorKittl, Jorge
dc.contributor.authorJurczak, Gosia
dc.contributor.authorAltimime, Laith
dc.contributor.authorRignanese, Gian-Marco
dc.contributor.authorPourtois, Geoffrey
dc.contributor.imecauthorSankaran, Kiroubanand
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorMees, Maarten
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecSankaran, Kiroubanand::0000-0001-6988-7269
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecMees, Maarten::0000-0001-7217-5510
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.accessioned2021-10-20T15:42:51Z
dc.date.available2021-10-20T15:42:51Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21455
dc.source.beginpage317
dc.source.conferenceDielectrics for Nanosystems 5: Materials Science, Processing, Reliability, and Manufacturing -and- Tutorials in Nanotechnology
dc.source.conferencedate6/05/2012
dc.source.conferencelocationSeattle, WA USA
dc.source.endpage330
dc.title

Modeling of copper diffusion in amorphous aluminum oxide in CBRAM memory stack

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
24521.pdf
Size:
329.94 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions