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Ultra-thin oxynitride gate dielectrics by pulsed-RF DPN for 65 nm general purpose CMOS applications
Publication:
Ultra-thin oxynitride gate dielectrics by pulsed-RF DPN for 65 nm general purpose CMOS applications
Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Cubaynes, Florence
;
Rothschild, Aude
;
Mertens, Sofie
;
Degraeve, Robin
;
O'Connor, Robert
;
Olsen, Chris
;
Date, Lucien
;
Schaekers, Marc
;
Dachs, Charles
;
Jurczak, Gosia
Journal
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1960
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1960
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations