Publication:

Physically-based compact models for fast lithography simulation

Date

2005
Proceedings Paper
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dc.contributor.authorLafferty, Neal
dc.contributor.authorAdam, Kostas
dc.contributor.authorGranik, Yuri
dc.contributor.authorTorres, Andres
dc.contributor.authorMaurer, Wilhelm
dc.date.accessioned2021-10-16T02:41:56Z
dc.date.available2021-10-16T02:41:56Z
dc.date.embargo9999-12-31
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10732
dc.source.beginpage537
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate1/03/2005
dc.source.conferencelocationSan Jose, CA USA
dc.source.endpage542
dc.title

Physically-based compact models for fast lithography simulation

dc.typeProceedings paper
dspace.entity.typePublication
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