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Low temperature pre-epi treatment: critical parameters to control interface contamination

Date

2008
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dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorLeys, Frederik
dc.contributor.authorWada, Masayuki
dc.contributor.authorSano, Ken-Ichi
dc.contributor.authorDe Vos, Brecht
dc.contributor.authorPacco, Antoine
dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorVerheyen, Peter
dc.contributor.authorVanherle, Wendy
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorDe Vos, Brecht
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorVanherle, Wendy
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-17T08:30:40Z
dc.date.available2021-10-17T08:30:40Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14060
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBrugge Belgium
dc.title

Low temperature pre-epi treatment: critical parameters to control interface contamination

dc.typeOral presentation
dspace.entity.typePublication
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