Status of ArF lithography for the 130nm technology node

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Author(s)

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Vandenberghe, Geert

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Jaenen, Patrick

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Delvaux, Christie

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Vangoidsenhoven, Diziana

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Van Roey, Frieda

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Pollers, Ingrid

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Maenhoudt, Mireille

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Goethals, Mieke

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Pollentier, Ivan

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van Ingen Schenau, K.

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Niroomand, Ardavan

Metrics

2004 since deposited on 2021-10-14

Acq. date: 2025-10-23