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Optimization toward Non-Zero Offset Stability in Overlay Control: Trends and Prospects

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cris.virtual.orcid0000-0003-4745-0167
cris.virtual.orcid0009-0005-9001-0302
cris.virtual.orcid0000-0003-1356-9186
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cris.virtualsource.department8b2d52c3-6166-486e-97c2-49dee20e1bd1
cris.virtualsource.orcid264c186e-7bc4-4bed-8d4f-11fe1bff9e26
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dc.contributor.authorGutman, Nadav
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorYang, Hongcheon
dc.contributor.authorBeral, Christophe
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorBouckou, Loemba
dc.contributor.authorGronheid, Roel
dc.contributor.authorWeiss, Yaniv
dc.contributor.authorNapso, Sofia Linoy
dc.contributor.authorNagar-shaul
dc.contributor.authorZhang, Chufan
dc.contributor.authorKlein, Dana
dc.contributor.authorLamhot, Yuval
dc.contributor.authorLubashevsky, Yuval
dc.contributor.authorMilo, Renan
dc.contributor.authorMegged, Efi
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorYang, Hongcheon
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.orcidimecYang, Hongcheon::0009-0005-9001-0302
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.date.accessioned2025-07-28T03:57:28Z
dc.date.available2025-07-28T03:57:28Z
dc.date.issued2025
dc.description.wosFundingTextThis work has been enabled in part by the NanoIC pilot line. The acquisition and operation are jointly funded by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland and Romania. For more information, visit nanoic-project.eu.
dc.identifier.doi10.1117/12.3051073
dc.identifier.eisbn978-1-5106-8639-7
dc.identifier.isbn978-1-5106-8638-0
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45957
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage134260I-1
dc.source.conference2025 Conference on Metrology Inspection and Process Control-Annual
dc.source.conferencedate2025-02-24
dc.source.conferencelocationSan Jose
dc.source.endpage134260I-7
dc.source.journalProceedings of SPIE
dc.source.numberofpages7
dc.title

Optimization toward Non-Zero Offset Stability in Overlay Control: Trends and Prospects

dc.typeProceedings paper
dspace.entity.typePublication
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