Publication:
Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
Date
| dc.contributor.author | D'have, Koen | |
| dc.contributor.author | Machida, Takahiro | |
| dc.contributor.author | Laidler, David | |
| dc.contributor.author | Cheng, Shaunee | |
| dc.contributor.imecauthor | D'have, Koen | |
| dc.contributor.imecauthor | Laidler, David | |
| dc.contributor.orcidimec | D'have, Koen::0000-0002-5195-9241 | |
| dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
| dc.date.accessioned | 2021-10-16T15:50:21Z | |
| dc.date.available | 2021-10-16T15:50:21Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12069 | |
| dc.source.beginpage | 651805 | |
| dc.source.conference | Metrology, Inspection and Process Control for Microlithography XXI | |
| dc.source.conferencedate | 25/02/2007 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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