Publication:

A step towards a better understanding of silicon passivated (100) Ge p-channel

Date

2007
Proceedings Paper
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dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorHoussa, Michel
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorLeys, Frederik
dc.contributor.authorKaczer, Ben
dc.contributor.authorMartens, Koen
dc.contributor.authorCaymax, Matty
dc.contributor.authorMeuris, Marc
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorMartens, Koen
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecMartens, Koen::0000-0001-7135-5536
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-16T18:48:55Z
dc.date.available2021-10-16T18:48:55Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12739
dc.source.beginpage53
dc.source.conferenceAdvanced Gate Stack , Source/Drain and Channel Engineering for Si-Based CMOS 3
dc.source.conferencedate6/05/2007
dc.source.conferencelocationChicago, IL USA
dc.source.endpage63
dc.title

A step towards a better understanding of silicon passivated (100) Ge p-channel

dc.typeProceedings paper
dspace.entity.typePublication
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