Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications

dc.contributor.author	Florent, Karine
dc.contributor.author	Lavizzari, Simone
dc.contributor.author	Popovici, Mihaela Ioana
dc.contributor.author	Di Piazza, Luca
dc.contributor.author	Celano, Umberto
dc.contributor.author	Groeseneken, Guido
dc.contributor.author	Van Houdt, Jan
dc.contributor.imecauthor	Popovici, Mihaela Ioana
dc.contributor.imecauthor	Di Piazza, Luca
dc.contributor.imecauthor	Celano, Umberto
dc.contributor.imecauthor	Groeseneken, Guido
dc.contributor.imecauthor	Van Houdt, Jan
dc.contributor.orcidimec	Celano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimec	Groeseneken, Guido::0000-0003-3763-2098
dc.contributor.orcidimec	Van Houdt, Jan::0000-0003-1381-6925
dc.date.accessioned	2021-10-24T04:46:36Z
dc.date.available	2021-10-24T04:46:36Z
dc.date.issued	2017
dc.identifier.issn	0021-8979
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/28343
dc.identifier.url	http://aip.scitation.org/doi/abs/10.1063/1.4984068
dc.source.beginpage	204103
dc.source.issue	20
dc.source.journal	Journal of Applied Physics
dc.source.volume	121
dc.title	Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications
dc.type	Journal article
dspace.entity.type	Publication
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