Publication:
Plasma etching: from micro to nanoelectronics
Date
| dc.contributor.author | Shamiryan, Denis | |
| dc.contributor.author | Paraschiv, Vasile | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.imecauthor | Paraschiv, Vasile | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-18T02:56:24Z | |
| dc.date.available | 2021-10-18T02:56:24Z | |
| dc.date.issued | 2009 | |
| dc.identifier.issn | 0018-1439 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16207 | |
| dc.source.beginpage | 250 | |
| dc.source.endpage | 258 | |
| dc.source.issue | 3 | |
| dc.source.journal | High Energy Chemistry | |
| dc.source.volume | 43 | |
| dc.title | Plasma etching: from micro to nanoelectronics | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |