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Cu resistivity scaling limits for 20 nm copper damascene lines
Publication:
Cu resistivity scaling limits for 20 nm copper damascene lines
Date
2007
Proceedings Paper
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15349.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Olmen, Jan
;
List, Scott
;
Tokei, Zsolt
;
Carbonell, Laure
;
Brongersma, Sywert
;
Volders, Henny
;
Kunnen, Eddy
;
Heylen, Nancy
;
Ciofi, Ivan
;
Khandelwal, A.
;
Gelatos, J.
;
Mandrekar, T.
;
Boelen, Pieter
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2007
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
2007
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations