Publication:
OPC and Modeling Solution to Support 0.55NA EUV Stitching
| dc.contributor.author | Zeng, Qinglin | |
| dc.contributor.author | Xu, Dongbo | |
| dc.contributor.author | Zeng, Xuefeng | |
| dc.contributor.author | Gillijns, Werner | |
| dc.contributor.author | Tejnil, Edita | |
| dc.contributor.author | Sun, Yuyang | |
| dc.contributor.author | Fenger, Germain | |
| dc.contributor.imecauthor | Gillijns, Werner | |
| dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
| dc.date.accessioned | 2025-06-17T12:09:03Z | |
| dc.date.available | 2025-05-11T05:43:39Z | |
| dc.date.available | 2025-06-17T12:09:03Z | |
| dc.date.issued | 2024 | |
| dc.description.wosFundingText | This work is partially founded by the European Union by 10ACE (Project: 101139972 - 10ACe - HORIZON-KDT-JU-2023-1-IA). Views and opinions expressed are however those of the author(s) only and do not necessarily reflect those of the European Union or the Chips Joint Undertaking. Neither the European Union nor the granting authority can be held responsible for them. | |
| dc.identifier.doi | 10.1117/12.3034957 | |
| dc.identifier.eisbn | 978-1-5106-8156-9 | |
| dc.identifier.isbn | 978-1-5106-8155-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45642 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | Art. 1321507 | |
| dc.source.conference | 2024 International Conference on Extreme Ultraviolet Lithography | |
| dc.source.conferencedate | SEP 30-OCT 03, 2024 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 8 | |
| dc.source.volume | 13215 | |
| dc.title | OPC and Modeling Solution to Support 0.55NA EUV Stitching | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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