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A DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier
Publication:
A DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier
Date
2008
Journal article
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18767.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Chao
;
Ahn, Jae Young
;
Horiguchi, Naoto
;
Demuynck, Steven
;
Tokei, Zsolt
Journal
Microelectronic Engineering
Abstract
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1963
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1963
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations