Publication:

Challenges for 0.35-0.25 μm optical lithography

Date

1995
Journal article
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dc.contributor.authorVan den hove, Luc
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-09-29T13:18:41Z
dc.date.available2021-09-29T13:18:41Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/930
dc.source.beginpage357
dc.source.endpage365
dc.source.issue1_4
dc.source.journalMicroelectronic Engineering
dc.source.volume27
dc.title

Challenges for 0.35-0.25 μm optical lithography

dc.typeJournal article
dspace.entity.typePublication
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