Publication:

Mechanisms of TiN effective workfunction tuning at interfaces with HfO2 and SiO2

Date

2020
Journal article
https://doi.org/10.1021/acs.jpcc.0c03605
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-4778-5709
cris.virtualsource.department30e0d104-74ca-43d2-a6b2-a2552c9bca3a
cris.virtualsource.orcid30e0d104-74ca-43d2-a6b2-a2552c9bca3a
dc.contributor.authorFilatova, Elena
dc.contributor.authorKonashuk, Aleksei
dc.contributor.authorSakhonenkov, Sergei
dc.contributor.authorGaisin, Aidar
dc.contributor.authorKolomiiets, Nadia
dc.contributor.authorAfanas'ev, Valeri
dc.contributor.authorDekkers, Harold
dc.contributor.imecauthorDekkers, Harold
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.date.accessioned2021-10-28T21:41:03Z
dc.date.available2021-10-28T21:41:03Z
dc.date.issued2020
dc.identifier.doi10.1021/acs.jpcc.0c03605
dc.identifier.issn1932-7447
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35123
dc.source.beginpage15547
dc.source.endpage15557
dc.source.issue28
dc.source.journalJournal of Physical Chemistry C
dc.source.volume124
dc.title

Mechanisms of TiN effective workfunction tuning at interfaces with HfO2 and SiO2

dc.typeJournal article
dspace.entity.typePublication
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