Publication:

Spacer defined double patterning for (sub-)20nm half pitch single damascene structures

Date

2011
Proceedings Paper
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dc.contributor.authorVersluijs, Janko
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorKunnen, Eddy
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorDemuynck, Steven
dc.contributor.authorWiaux, Vincent
dc.contributor.authorDekkers, Harold
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.date.accessioned2021-10-19T21:15:52Z
dc.date.available2021-10-19T21:15:52Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20086
dc.source.beginpage79731R
dc.source.conferenceOptical Microlithography XXIV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan José (CA) USA
dc.title

Spacer defined double patterning for (sub-)20nm half pitch single damascene structures

dc.typeProceedings paper
dspace.entity.typePublication
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