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Optimization of post etch cobalt compatible clean by pH and oxidizer

Date

2018
Proceedings Paper
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dc.contributor.authorIino, H.
dc.contributor.authorOgawa, Y.
dc.contributor.authorMasaoka, T.
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorRip, Jens
dc.contributor.authorOniki, Yusuke
dc.contributor.authorAkanishi, Y.
dc.contributor.authorIwasaki, Akihisa
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.date.accessioned2021-10-25T20:08:23Z
dc.date.available2021-10-25T20:08:23Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30934
dc.identifier.urlhttps://www.scientific.net/SSP.282.268
dc.source.beginpage268
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIV - UCPSS
dc.source.conferencedate2/09/2018
dc.source.conferencelocationLeuven Belgium
dc.source.endpage272
dc.title

Optimization of post etch cobalt compatible clean by pH and oxidizer

dc.typeProceedings paper
dspace.entity.typePublication
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