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Improved characterization of high-k degradation with vacuum C-AFM

Date

2008
Proceedings Paper
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dc.contributor.authorPolspoel, Wouter
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAguilera, Lidia
dc.contributor.authorPorti, Marc
dc.contributor.authorNafria, Montserrat
dc.contributor.authorAymerich, Xavier
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-17T09:55:20Z
dc.date.available2021-10-17T09:55:20Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14328
dc.source.beginpage1074-I11-02
dc.source.conferenceSynthesis and Metrology of Nanoscale Oxides and Thin Films
dc.source.conferencedate22/03/2008
dc.source.conferencelocationSan Fransisco, CA USA
dc.title

Improved characterization of high-k degradation with vacuum C-AFM

dc.typeProceedings paper
dspace.entity.typePublication
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