Publication:

Controlled orientation of molecular-beam-epitaxial BaTiO3 on Si(001) using thickness engineering of BaTiO3 and SrTiO3 buffer layers

Date

2017-05
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dc.contributor.authorHsu, Mark
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorFavia, Paola
dc.contributor.authorVila Santos, Maria
dc.contributor.authorCid Barreno, Rosalia
dc.contributor.authorRubio-Zuazo, Juan
dc.contributor.authorR. Castro, German
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorAbsil, Philippe
dc.contributor.authorMerckling, Clement
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorMerckling, Clement
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.date.accessioned2021-10-24T05:57:14Z
dc.date.available2021-10-24T05:57:14Z
dc.date.embargo9999-12-31
dc.date.issued2017-05
dc.identifier.issn1882-0778
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28540
dc.identifier.urlhttp://iopscience.iop.org/article/10.7567/APEX.10.065501/meta
dc.source.beginpage65501
dc.source.issue6
dc.source.journalApplied Physics Express
dc.source.volume10
dc.title

Controlled orientation of molecular-beam-epitaxial BaTiO3 on Si(001) using thickness engineering of BaTiO3 and SrTiO3 buffer layers

dc.typeJournal article
dspace.entity.typePublication
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