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Low-Temperature Chemical Vapor Deposition of SiCN for Hybrid Bonding

 
dc.contributor.authorOnishi, Koki
dc.contributor.authorIwata, Tomoya
dc.contributor.authorHabuka, Hitoshi
dc.contributor.authorNagano, Fuya
dc.contributor.authorInoue, Fumihiro
dc.contributor.imecauthorNagano, Fuya
dc.contributor.orcidimecNagano, Fuya::0000-0001-5315-8694
dc.date.accessioned2022-12-19T10:03:31Z
dc.date.available2022-09-22T02:50:45Z
dc.date.available2022-12-19T10:03:31Z
dc.date.issued2022
dc.identifier.doi10.23919/ICEP55381.2022.9795550
dc.identifier.eisbn978-4-9911911-3-8
dc.identifier.issnna
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40482
dc.publisherIEEE
dc.source.beginpage59
dc.source.conferenceInternational Conference on Electronics Packaging (ICEP)
dc.source.conferencedateMAY 11-14, 2022
dc.source.conferencelocationSapporo
dc.source.endpage60
dc.source.journalNEURO-ONCOLOGY. Vol. 24; Suppl. 2
dc.source.numberofpages2
dc.title

Low-Temperature Chemical Vapor Deposition of SiCN for Hybrid Bonding

dc.typeProceedings paper
dspace.entity.typePublication
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