Publication:
Development of a comprehensive metrology software platform dedicated to block copolymers thin film nanopatterns
Date
| dc.contributor.author | Derville, A. | |
| dc.contributor.author | Labrosse, A. | |
| dc.contributor.author | Zimmermann, Y. | |
| dc.contributor.author | Foucher, Johann | |
| dc.contributor.author | Singh, Arjun | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.imecauthor | Singh, Arjun | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.date.accessioned | 2021-10-22T18:59:55Z | |
| dc.date.available | 2021-10-22T18:59:55Z | |
| dc.date.issued | 2015 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25194 | |
| dc.source.conference | 1st International Symposium on DSA | |
| dc.source.conferencedate | 26/10/2015 | |
| dc.source.conferencelocation | Leuven Belgium | |
| dc.title | Development of a comprehensive metrology software platform dedicated to block copolymers thin film nanopatterns | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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