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The influence of hydrogen plasma treatment on LWR mitigation: The importance of EUV photoresist composition

Date

2014
Meeting abstract
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dc.contributor.authorDe Schepper, Peter
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-22T01:08:43Z
dc.date.available2021-10-22T01:08:43Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23720
dc.source.conferenceMicro and Nano Engineering 2014
dc.source.conferencedate22/09/2014
dc.source.conferencelocationLausanne Switzerland
dc.title

The influence of hydrogen plasma treatment on LWR mitigation: The importance of EUV photoresist composition

dc.typeMeeting abstract
dspace.entity.typePublication
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