Publication:
In-chip overlay metrology in 90 nm production
Date
| dc.contributor.author | Schultz, Bernd | |
| dc.contributor.author | Seltmann, Rolf | |
| dc.contributor.author | Paufler, Joerg | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Kassel, Elyakim | |
| dc.contributor.author | Adel, Mike | |
| dc.contributor.author | Izikson, Pavel | |
| dc.contributor.author | Frommer, Aviv | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.date.accessioned | 2021-10-16T04:56:17Z | |
| dc.date.available | 2021-10-16T04:56:17Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11182 | |
| dc.source.conference | International Symposium Semiconductor Manufacturing | |
| dc.source.conferencedate | 13/09/2005 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | In-chip overlay metrology in 90 nm production | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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