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The thermal stability of ALD Zr:Al mixed oxide thin films: an in situ TEM study
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The thermal stability of ALD Zr:Al mixed oxide thin films: an in situ TEM study
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Date
2005-07
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nistor, L.C.
;
Richard, Olivier
;
Zhao, Chao
;
Bender, Hugo
;
Van Tendeloo, G.
Journal
Journal of Materials Research
Abstract
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1864
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-10
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Metrics
Views
1864
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-10
Citations