Publication:

Accuracy assessment between on product and on-optical-target overlay metrology with optical microscopy, SEM and STEM

Date

2020
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorAbranovitz, Yaniv
dc.contributor.authorLevin, G.
dc.contributor.authorSarig, L.
dc.contributor.authorLevi, S.
dc.contributor.authorAdan, O.
dc.contributor.authorTilson, A.
dc.contributor.authorArjavac, J.
dc.contributor.authorStrauss, M.
dc.contributor.authorKwakman, L.
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-28T20:08:57Z
dc.date.available2021-10-28T20:08:57Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34584
dc.identifier.urlhttps://doi.org/10.1117/12.2563606
dc.source.beginpage1132508
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate20/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.title

Accuracy assessment between on product and on-optical-target overlay metrology with optical microscopy, SEM and STEM

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions