Publication:
Phase Shifting Masks for Optical Lithography: Principles, Manufacturing, and Imaging Performance
Date
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.thesisadvisor | Declerck, Gilbert | |
| dc.date.accessioned | 2021-09-29T12:46:17Z | |
| dc.date.available | 2021-09-29T12:46:17Z | |
| dc.date.issued | 1994-09 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/319 | |
| dc.title | Phase Shifting Masks for Optical Lithography: Principles, Manufacturing, and Imaging Performance | |
| dc.type | PHD thesis | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |