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Modification of BARC layer by UV irradiation for post-etch wet strip applications in BEOL

Date

2010
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dc.contributor.authorKesters, Els
dc.contributor.authorLux, Marcel
dc.contributor.authorPittevils, Joris
dc.contributor.authorVereecke, Guy
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-18T17:35:54Z
dc.date.available2021-10-18T17:35:54Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17362
dc.source.conference3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate4/03/2010
dc.source.conferencelocationGrenoble France
dc.title

Modification of BARC layer by UV irradiation for post-etch wet strip applications in BEOL

dc.typeMeeting abstract
dspace.entity.typePublication
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