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Unusual noise behavior versus temperature in nFinFETs on silicon on insulator (SOI) substrates processed with different strain techniques

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dc.contributor.authorGuo, Wei
dc.contributor.authorRoutoure, J.M.
dc.contributor.authorCretu, B.
dc.contributor.authorCarin, R.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorCollaert, Nadine
dc.contributor.authorPut, Sofie
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorGuo, Wei
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-17T07:28:55Z
dc.date.available2021-10-17T07:28:55Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13827
dc.source.beginpage141
dc.source.conferenceEUROSOI Workshop Proceedings: 4th Workshop of the Thematic Network on Silicon-on-Insulator Technology, Devices and Circuits
dc.source.conferencedate23/01/2008
dc.source.conferencelocationCork Ireland
dc.source.endpage142
dc.title

Unusual noise behavior versus temperature in nFinFETs on silicon on insulator (SOI) substrates processed with different strain techniques

dc.typeProceedings paper
dspace.entity.typePublication
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