Publication:

Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC

Date

2009-09
Proceedings Paper
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dc.contributor.authorNikolsky, Peter
dc.contributor.authorDavydova, Natalia
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLorusso, Gian
dc.contributor.authorJiang, Jiong
dc.contributor.authorLiu, Wei
dc.contributor.authorLiu, Huayu
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorLiu, Wei
dc.contributor.orcidimecLiu, Wei::0000-0002-6573-2881
dc.date.accessioned2021-10-18T01:10:07Z
dc.date.available2021-10-18T01:10:07Z
dc.date.embargo9999-12-31
dc.date.issued2009-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15925
dc.source.beginpage74882N
dc.source.conferencePhotomask Technology 2009
dc.source.conferencedate14/09/2009
dc.source.conferencelocationMonterey, CA USA
dc.title

Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC

dc.typeProceedings paper
dspace.entity.typePublication
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