Publication:
Electronic structure of GeO2-passivated interfaces of (100)Ge with Al2O3 and HfO2
Date
| dc.contributor.author | Afanasiev, Valeri | |
| dc.contributor.author | Stesmans, Andre | |
| dc.contributor.author | Delabie, Annelies | |
| dc.contributor.author | Houssa, Michel | |
| dc.contributor.imecauthor | Afanasiev, Valeri | |
| dc.contributor.imecauthor | Stesmans, Andre | |
| dc.contributor.imecauthor | Delabie, Annelies | |
| dc.contributor.imecauthor | Houssa, Michel | |
| dc.contributor.orcidimec | Houssa, Michel::0000-0003-1844-3515 | |
| dc.date.accessioned | 2021-10-16T15:00:12Z | |
| dc.date.available | 2021-10-16T15:00:12Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11628 | |
| dc.source.conference | 38th IEEE Semiconductor Interface Specialists Conference - SISC | |
| dc.source.conferencedate | 6/12/2007 | |
| dc.source.conferencelocation | Arlington, VA USA | |
| dc.title | Electronic structure of GeO2-passivated interfaces of (100)Ge with Al2O3 and HfO2 | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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