Publication:

Ion implantation in Ge and associated defect control

Date

2005-09
Proceedings Paper
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dc.contributor.authorSatta, Alessandra
dc.contributor.authorSimoen, Eddy
dc.contributor.authorJanssens, Tom
dc.contributor.authorBenedetti, Alessandro
dc.contributor.authorClarysse, Trudo
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorGeenen, Luc
dc.contributor.authorBrijs, Bert
dc.contributor.authorMeuris, Marc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-16T04:51:22Z
dc.date.available2021-10-16T04:51:22Z
dc.date.issued2005-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11167
dc.source.beginpage52
dc.source.conferenceCrystalline Defects and Contamination: Their Impact and Control in Device Manufacturing IV
dc.source.conferencedate14/09/2005
dc.source.conferencelocationGrenoble France
dc.source.endpage58
dc.title

Ion implantation in Ge and associated defect control

dc.typeProceedings paper
dspace.entity.typePublication
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