Publication:
Effect of the dielectric thickness and the metal deposition technique on the mobility for HfO2/TaN NMOS devices
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1916 since deposited on 2021-10-16
4last month
2last week
Acq. date: 2026-01-25
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Statistics
Views
1916 since deposited on 2021-10-16
4last month
2last week
Acq. date: 2026-01-25
Citations