Publication:

Effect of the dielectric thickness and the metal deposition technique on the mobility for HfO2/TaN NMOS devices

Date

2005

Journal article

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Author(s)

Trojman, Lionel

;

Ragnarsson, Lars-Ake

;

Pantisano, Luigi

;

Lujan, Guilherme

;

;

;

Schaekers, Marc

;

Van Ammel, Annemie

;

Groeseneken, Guido

;

De Gendt, Stefan

;

Journal

Microelectronic Engineering

Statistics

1918 since deposited on 2021-10-16

Acq. date: 2026-07-16