Publication:
Effect of the dielectric thickness and the metal deposition technique on the mobility for HfO2/TaN NMOS devices
Date
Loading...
Journal
Abstract
Description
Statistics
Views
1920 since deposited on 2021-10-16
2last month
2last week
Acq. date: 2026-08-07
Citations
Statistics
Views
1920 since deposited on 2021-10-16
2last month
2last week
Acq. date: 2026-08-07
Citations