Publication:

ALD barrier deposition on porous low-k dielectric materials for interconnects

Date

2011-10
Proceedings Paper
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dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDewilde, Sven
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorSwerts, Johan
dc.contributor.authorTielens, Hilde
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorWitters, Thomas
dc.contributor.authorVancoille, Eric
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorVancoille, Eric
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned2021-10-19T20:19:53Z
dc.date.available2021-10-19T20:19:53Z
dc.date.issued2011-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19971
dc.source.beginpage25
dc.source.conferenceAtomic Layer Deposition Applications 7
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
dc.source.endpage32
dc.title

ALD barrier deposition on porous low-k dielectric materials for interconnects

dc.typeProceedings paper
dspace.entity.typePublication
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