Publication:

Area-selective deposition by a combination of organic film passivation and atomic layer deposition

Date

2019
Proceedings Paper
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dc.contributor.authorPasquali, Mattia
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.contributor.imecauthorPasquali, Mattia
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecPasquali, Mattia::0000-0002-1309-1082
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2021-10-27T15:35:59Z
dc.date.available2021-10-27T15:35:59Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33752
dc.identifier.urlhttp://ecst.ecsdl.org/content/92/3/25.abstract
dc.source.beginpage25
dc.source.conferenceAtomic Layer Deposition Applications 15
dc.source.conferencedate13/10/2019
dc.source.conferencelocationAtlanta, GA USA
dc.source.endpage32
dc.title

Area-selective deposition by a combination of organic film passivation and atomic layer deposition

dc.typeProceedings paper
dspace.entity.typePublication
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