Publication:

Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node

Date

2011
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorGronheid, Roel
dc.contributor.authorYounkin, Todd
dc.contributor.authorLeeson, Michael J.
dc.contributor.authorFonseca, Carlos
dc.contributor.authorHooge, Joshua S.
dc.contributor.authorNafus, Kathleen
dc.contributor.authorBiafore, John J.
dc.contributor.authorSmith, Mark D.
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorNafus, Kathleen
dc.date.accessioned2021-10-19T14:01:15Z
dc.date.available2021-10-19T14:01:15Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19015
dc.source.beginpage33004
dc.source.issue3
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume10
dc.title

Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
23909.pdf
Size:
674.82 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles