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Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processing

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dc.contributor.authorAckaert, J.
dc.contributor.authorde Backer, E.
dc.contributor.authorCoppens, P.
dc.contributor.authorCreusen, Martin
dc.date.accessioned2021-10-06T10:40:51Z
dc.date.available2021-10-06T10:40:51Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3178
dc.source.conference1st European Symposium on Plasma Process Induced Damage (ESPID'1); 25-26 November 1999; Toulouse, France.
dc.title

Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processing

dc.typeOral presentation
dspace.entity.typePublication
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