Publication:

Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

Date

 
dc.contributor.authorKarim, Marwa
dc.contributor.authorMartini, Roberto
dc.contributor.authorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.authorDepauw, Valerie
dc.contributor.authorVan Nieuwenhuysen, Kris
dc.contributor.authorRamadan, Wegdan
dc.contributor.authorGordon, Ivan
dc.contributor.authorPoortmans, Jef
dc.contributor.imecauthorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecSivaramakrishnan Radhakrishnan, Hariharsudan::0000-0003-1963-273X
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-22T02:29:21Z
dc.date.available2021-10-22T02:29:21Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24034
dc.identifier.urlhttp://the-psst.com/psst2014/ISO%20B5%20libro%20PSST%202014-%20corrected%2020%20feb%202014.pdf
dc.source.beginpage56
dc.source.conferencePorous Semiconductors Science and Technology - PSST
dc.source.conferencedate9/03/2014
dc.source.conferencelocationAlicante Spain
dc.source.endpage57
dc.title

Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections: