Publication:

Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation

Date

2009
Proceedings Paper
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dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorClemente, Francesca
dc.contributor.authorVanstreels, Kris
dc.contributor.authorConard, Thierry
dc.contributor.authorVogt, Tatjana
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-18T03:46:27Z
dc.date.available2021-10-18T03:46:27Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16330
dc.source.beginpage187
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage194
dc.title

Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation

dc.typeProceedings paper
dspace.entity.typePublication
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