Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Reducing agents for the atomic layer deposition of WS2 from the WF6 and H2S precursors
Publication:
Reducing agents for the atomic layer deposition of WS2 from the WF6 and H2S precursors
Copy permalink
Date
2015-07
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delabie, Annelies
;
Heyne, Markus
;
Groven, Benjamin
;
Haesevoets, Karel
;
Meersschaut, Johan
;
Nuytten, Thomas
;
Verdonck, Patrick
;
Van Elshocht, Sven
;
Heyns, Marc
;
Radu, Iuliana
;
Caymax, Matty
Journal
Abstract
Description
Metrics
Views
1892
since deposited on 2021-10-22
Acq. date: 2025-12-15
Citations
Metrics
Views
1892
since deposited on 2021-10-22
Acq. date: 2025-12-15
Citations