Publication:
Comparison of CF4, CHF3, and CH2F2 plasmas used for wafer processing
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2274 since deposited on 2021-10-20
4last month
Acq. date: 2026-02-24
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Statistics
Views
2274 since deposited on 2021-10-20
4last month
Acq. date: 2026-02-24
Citations