Publication:

Interaction of F atoms with SiCOH ultra low-k films. Part II: Etching

Date

2015
Journal article
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Author(s)

Rakhimova, T.
;
Lopaev, D.
;
Mankelevich, Y.
;
Kurchikov, K.
;
Zyryanov, S.
;
Palov, A.P.
;
Proshina, O.V.
;
Maslakov, K.
;
Baklanov, Mikhaïl

Journal

Journal of Physics D: Applied Physics

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1941 since deposited on 2021-10-22
2last month
Acq. date: 2026-02-28

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1941 since deposited on 2021-10-22
2last month
Acq. date: 2026-02-28

Citations