Publication:

Process development using negative tone development for the dark field critical layers in a 28 nm node process

Date

2012
Proceedings Paper
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dc.contributor.authorVersluijs, Janko
dc.contributor.authorTruffert, Vincent
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorWiaux, Vincent
dc.contributor.authorKunnen, Eddy
dc.contributor.authorSouriau, Laurent
dc.contributor.authorDemuynck, Steven
dc.contributor.authorErcken, Monique
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorErcken, Monique
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.date.accessioned2021-10-20T18:32:21Z
dc.date.available2021-10-20T18:32:21Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21798
dc.source.beginpage83260W
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
dc.title

Process development using negative tone development for the dark field critical layers in a 28 nm node process

dc.typeProceedings paper
dspace.entity.typePublication
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