Publication:
EUV resist screening: current performance and issues
Date
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.author | Van Roey, Frieda | |
| dc.contributor.author | Solak, Harun | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.contributor.imecauthor | Van Roey, Frieda | |
| dc.date.accessioned | 2021-10-16T01:44:54Z | |
| dc.date.available | 2021-10-16T01:44:54Z | |
| dc.date.issued | 2005-06 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10503 | |
| dc.source.beginpage | 647 | |
| dc.source.endpage | 654 | |
| dc.source.issue | 5 | |
| dc.source.journal | Journal of Photopolymer Science and Technology | |
| dc.source.volume | 18 | |
| dc.title | EUV resist screening: current performance and issues | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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