Publication:
Double hard mask strategy for patterning 0.186 micron2 SRAM cells using FinFET technology
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1928 since deposited on 2021-10-17
2last month
Acq. date: 2025-12-14
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Metrics
Views
1928 since deposited on 2021-10-17
2last month
Acq. date: 2025-12-14
Citations