Publication:
Double hard mask strategy for patterning 0.186 micron2 SRAM cells using FinFET technology
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1930 since deposited on 2021-10-17
2last month
Acq. date: 2026-01-27
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Statistics
Views
1930 since deposited on 2021-10-17
2last month
Acq. date: 2026-01-27
Citations