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Horizontal, stacked or vertical silicon nanowires: Does it Matter from a Low-Frequency Noise Perspective

Date

2021
Proceedings Paper
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dc.contributor.authorSimoen, Eddy
dc.contributor.authorOliveira, Alberto
dc.contributor.authorAgopian, Paula G der
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorMertens, Hans
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorMartino, Joao A
dc.contributor.authorClaeys, Cor
dc.contributor.authorVeloso, Anabela
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-31T11:14:00Z
dc.date.available2021-10-31T11:14:00Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37181
dc.identifier.urlhttps://ieeexplore.ieee.org/document/9365338
dc.source.beginpage1
dc.source.conference2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)
dc.source.conferencedate31/03/2020
dc.source.conferencelocationCaen France
dc.source.endpage6
dc.title

Horizontal, stacked or vertical silicon nanowires: Does it Matter from a Low-Frequency Noise Perspective

dc.typeProceedings paper
dspace.entity.typePublication
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