Publication:
Design Technology Co-Optimization for the DRAM Cell Structure With Contact Resistance Variation
| dc.contributor.author | Lee, Jaehyun | |
| dc.contributor.author | Asenov, Plamen | |
| dc.contributor.author | Rhyner, Reto | |
| dc.contributor.author | Kao, Ethan | |
| dc.contributor.author | Amoroso, Salvatore M. | |
| dc.contributor.author | Brown, Andrew R. | |
| dc.contributor.author | Lin, Xi-Wei | |
| dc.contributor.author | Moroz, Victor | |
| dc.contributor.imecauthor | Kao, Ethan | |
| dc.contributor.orcidimec | Kao, Ethan::0000-0003-1662-585X | |
| dc.date.accessioned | 2024-08-22T12:03:00Z | |
| dc.date.available | 2024-03-14T18:00:41Z | |
| dc.date.available | 2024-08-22T12:03:00Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1109/TED.2024.3357615 | |
| dc.identifier.issn | 0018-9383 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43669 | |
| dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | |
| dc.source.beginpage | 1893 | |
| dc.source.endpage | 1899 | |
| dc.source.issue | 3 | |
| dc.source.journal | IEEE TRANSACTIONS ON ELECTRON DEVICES | |
| dc.source.numberofpages | 7 | |
| dc.source.volume | 71 | |
| dc.subject.keywords | RETENTION TIME DISTRIBUTION | |
| dc.subject.keywords | CHALLENGES | |
| dc.subject.keywords | ISSUES | |
| dc.title | Design Technology Co-Optimization for the DRAM Cell Structure With Contact Resistance Variation | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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